High- dielectric - PDFSEARCH.IO - Document Search Engine

High- dielectric
Results: 130

#	Item
21	Photon Factory Activity Report 2009 #27 Part BSurface and Interface 18A/2008G186 Effect of oxygen coadsorption on titanium silicide formation on Si(001) Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-12-27 22:22:08 Ceramic materials Atomic physics Molecular physics Spectroscopy X-ray photoelectron spectroscopy Silicon dioxide Oxide High-k dielectric Silicide Chemistry Matter Anions
22	Surface and Interface 2C/2002S2-002 Chemical reaction and metallic cluster formation by annealing-temperature control in ZrO2 gate insulator on Si Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:30:04 Annealing Silicide Photoemission spectroscopy Chemistry Physics Electrical engineering Electronic engineering High-k dielectric Transistors
23	Photon Factory Activity Report 2010 #28 Part BSurface and Interface 2C/2008S2-003 Effect of nitrogen bonding states on dipole at the HfSiO/SiON interface studied by Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2012-01-30 04:32:45 Electronic engineering Semiconductor device fabrication Atomic physics Electromagnetism Photoemission spectroscopy High-k dielectric Titanium nitride Spectroscopy Core electron Physics Chemistry Emission spectroscopy
24	Photon Factory Activity Report 2006 #24 Part BSurface and Interface 2C/2005S2-002 Analysis of x-ray irradiation effect in high-k gate dielectrics by time-dependent Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:33:37 Emission spectroscopy Photoemission spectroscopy Atomic physics High-k dielectric Core electron Electron Physics Chemistry Spectroscopy
25	E:書エ研告書 ctivityeportEnglish4.doc Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2013-09-26 20:31:32 Ceramic materials Superhard materials Nitrides Silicon nitride High-k dielectric Silicon Light-emitting diode Chemistry Matter Materials science
26	Photon Factory Activity Report 2006 #24 Part BChemistry 2C/2005S2-002 Thermal decomposition of LaAlO3/SiO2/Si gate stack structures studied by Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:34:17 Transistors Silicon dioxide Ultra-high vacuum MOSFET Gallium nitride Annealing Chemistry Electronic engineering High-k dielectric
27	Photon Factory Activity Report 2008 #26 Part BSurface and Interface 2C/2008S2-003 In-depth profiles of Hf-based gate insulator films on Si substrates studied by angle-resolved photoemission spectroscopy Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:36:04 High-k dielectric Transistors Physics Photoemission spectroscopy Chemistry Angle-resolved photoemission spectroscopy Annealing Layer Materials science Emission spectroscopy Semiconductor device fabrication Electronic engineering
28	Photon Factory Activity Report 2006 #24 Part BSurface and Interface 2C/2005S2-002 Suppression of silicidation and crystallization by atmosphere controlled annealing Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-01-05 10:33:38 Spectroscopy Emission spectroscopy Annealing Silicide Polycrystalline silicon Photoemission spectroscopy High-k dielectric Absorption spectroscopy Core electron Chemistry Physics Science
29	Photon Factory Activity Report 2008 #26 Part BSurface and Interface 2C/2005S2-002 Control of oxidation and reduction in HfSiON/Si through N2 exposure Hiroyuki KAMADA1, Tatsuhiko TANIMURA1, Satoshi TOYODA1-3, Hir Add to Reading List Source URL: pfwww.kek.jp Language: English* - Date: 2010-01-05 10:36:03 Thin film deposition Electronic engineering High-k dielectric Transistors Ceramic materials Gate dielectric Atomic layer deposition Annealing Equivalent oxide thickness Chemistry Materials science Electromagnetism
30	Photon Factory Activity Report 2009 #27 Part BSurface and Interface 2C/2008S2003 Interfacial reactions for Ru metal-electrode/HfSiON gate stack structures studied Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-12-27 22:22:07 Semiconductor device fabrication Superhard materials Transistors Ceramic materials Atomic layer deposition High-k dielectric Ruthenium(IV) oxide Silicon dioxide Titanium nitride Chemistry Matter Electronic engineering

UPDATE